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SmartPATTERN®

Quartz photomasks for cell micropatterning

Create defined cell-adhesive geometries on glass coverslips using deep-UV micropatterning.

 

The 4Dcell quartz photomask features a patterned chromium coating that controls where UV light reaches the prepared surface. Following protein coating and cell seeding, the resulting micropatterns help control cell adhesion, shape and spatial organization.

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Choose a standard geometry or request a custom photomask tailored to your experimental design.

Zoomed 4Dcell Quartz photomask for micropatterning

DESIGN FOR CONTROLLED CELL GEOMETRY

  • Defined micropattern dimensions: standard designs include features from 10 to 100 µm, depending on the geometry.

  • Coverslip alignment: positioning marks help align glass coverslips with the patterned areas.

  • Parallel preparation: the standard layout accommodates four 24 mm diameter coverslips simultaneously.

  • Design flexibility: choose from six standard geometries or request a custom pattern.

STANDARD PHOTOMASK DESIGNS

Choose from disks, lines, squares, rectangles, triangles and grids. The appropriate geometry and dimensions depend on your cell type, the adhesive area required and the biological question you want to investigate.

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The photomask catalog provides design-specific information on feature dimensions, spacing and pattern distribution. Use it to compare layouts and select a suitable reference for your experiment.

Standard positionning of micropattern areas on the photomask

PHOTOMASK SPECIFICATIONS

Specifications
Photomask specifications
Mask substrate
Quartz
Patterned coating
Chromium
Micropatterning method
Deep-UV exposure through the photomask
Standard geometries
Disks, lines, squares, rectangles, triangles and grids
Standard feature dimensions
10–100 µm, depending on the design
Standard coverslip layout
Four Ø24 mm glass coverslips
Alignment
Positioning marks for coverslip placement
Custom designs
Available on request
Accepted custom design formats
DXF, GDSII, EPS or PDF
Availability
Supplied separately or as part of a micropatterning kit

HOW DEEP-UV MICROPATTERNING WORKS?

Micropatterning Photomask action protocol

1. Prepare the glass surface

Prepare the coverslips and apply the anti-adhesive treatment according to the micropatterning protocol.

2. Position the coverslips and expose through the mask

​Place the treated surface in contact with the photomask and align it with the patterned areas. Deep-UV exposure selectively modifies the anti-adhesive layer through the transparent regions of the mask.

3. Apply the protein coating

Incubate the exposed surface with the protein solution specified in your protocol to create adhesive regions within the surrounding anti-adhesive background.

4. Seed the cells

Seed your cells onto the prepared coverslips. Cell attachment and spreading depend on the cell type, pattern dimensions, surface treatment and culture conditions.

EQUIPMENT & COMPATIBILITY

The photomask is one component of the micropatterning workflow. Preparing cell-adhesive patterns also requires a suitable deep-UV source, glass coverslips, surface-treatment reagents and a protein coating.

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The 4Dcell Masker can be used to improve contact between the photomask and the coverslips during exposure.

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If you already have a UV system, contact us to discuss its suitability for the intended protocol. For other coverslip dimensions or layouts, ask our team to confirm compatibility before ordering.

CUSTOM PHOTOMASKS FOR YOUR EXPERIMENTAL DESIGN

Need a geometry or layout beyond the standard catalog? Send us your design in DXF, GDSII, EPS or PDF format, or describe the patterns you want to produce.

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To help us assess your project, include the pattern geometry, dimensions, spacing, coverslip format and intended application.

Our team can discuss design feasibility and help define the photomask layout.

PUBLISHED USE OF 4DCELL PHOTOMASKS

Cimmino, Netti and Ventre used a 4Dcell quartz photomask and deep-UV printer to prepare adhesive protein micropatterns on light-responsive polymer substrates for mechanobiological studies.

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Their methods describe the substrate preparation, photomask exposure and fibronectin coating used in this specific experimental workflow.

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Cimmino et al., 2022 — Frontiers in Bioengineering and Biotechnology. L’utilisation du matériel est documentée dans les méthodes.

FREQUENTLY ASKED QUESTIONS

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FIND THE RIGHT PHOTOMASK FOR YOUR EXPERIMENT

Tell us about your cell model, the geometry you need and your current equipment. Our team will help you identify a suitable standard design or discuss a custom photomask.

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